With the development of science and technology, the manufacturing method of the light guide plate has been gradually improved, which is different from the early printing type, and we call it "non-printing type".
photolithography
The lithography technology is to coat a layer of corrosion-resistant photoresist on a flat silicon wafer, and then let strong light pass through the photoresist, and selectively expose on the photoresist according to the pattern information of the specific layer generated; the silicon wafer will A film with a micropatterned structure is left behind. The surface roughness of the light guide plate prepared by the photolithography method is poor, and the light energy loss is relatively large.
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