How to choose semiconductor lithography process lighting (T8 Yellow LED Tube Lighting Anti UV LED Tube)
1. Brightness requirements
In the semiconductor lithography process, the illumination light source ensures the imaging quality of the chip, so the brightness requirement is very important. Generally speaking, the brightness requirement for photolithography exposure is 100-150mW/cm². If the brightness is too low, it will cause underexposure and affect the clarity and accuracy of chip imaging.
2. Uniformity requirements
In addition to brightness requirements, uniformity in lighting is also an important factor. In the photolithography process, uniformity refers to the difference in brightness distribution everywhere on the projector. Generally speaking, the uniformity requirement is between 1% and 3%. If the uniformity is insufficient, it may cause uneven exposure of the chip, which will affect the clarity and accuracy of the image.
3. Color temperature requirements
The color temperature of lighting refers to the color of the lighting light. In the semiconductor lithography process, the choice of color temperature is also very important. Generally speaking, the color temperature requirement is between 3500K-5000K. If the color temperature is too low or too high, the imaging clarity and accuracy of the chip may be reduced.
In short, the lighting requirements in the semiconductor lithography process are very important, and certain requirements must be met in terms of brightness, uniformity, color temperature, etc. Only by ensuring the quality of lighting can we better ensure the quality and accuracy of chip imaging.
Specific detailed parameters:
1.100% abolishing ultraviolet ray (Filter wavelength < 500nm).
2.Germany inprovement material technology.
3.PC raw material V2 flame retardant rating.
4.Epistar LED chip 100-120lm/w,1500K -2000K
5.Built-in isolated power rubycon capacitor.
6.Yellow clear and frost cover are available.
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